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BUILT-IN WOLFRAM LANGUAGE SYMBOL
[f,{x,xmin,xmax},{y,ymin,ymax},{z,zmin,zmax}]produces a three-dimensional contour plot of f as a function of x, y, and z.
[f==g,{x,xmin,xmax},{y,ymin,ymax},{z,zmin,zmax}]plots the contour surface for which .
The contour surfaces plotted by
can contain disconnected parts.
By default,
shows each contour level as an opaque white surface, with normals pointing outward.
treats the variables x, y, and z as local, effectively using .
has attribute
and evaluates
only after assigning specific numerical values to x, y, and z.
In some cases, it may be more efficient to use
to evaluate
symbolically before specific numerical values are assigned to x, y, and z.
Nothing is plotted in any regions where
evaluates to .
has the same options as , with the following additions and changes:
whether to draw axes
how to draw boundaries of regions
{1,1,1}bounding 3D box ratios
how to color contour surfaces
whether to scale arguments to
how many or what contour surfaces to show
the style for contour surfaces
expression to evaluate at every function evaluation
the maximum number of recursive subdivisions allowed
how many mesh lines in each direction to draw
{#1&,#2&,#3&}how to determine the placement of mesh divisions
how to shade regions between mesh divisions
the style for mesh lines
the method to use for refining contour surfaces
how to determine effective surface normals
aspects of performance to try to optimize
legends for surfaces
the initial number of sample points in each direction
{,,,}the range of values to include
overall theme for the plot
(&)how to determine whether a point should be included
how to determine texture coordinates
whether to scale arguments to
the precision used in internal computations
initially evaluates
at a 3D grid of equally spaced sample points specified by . Then it uses an adaptive algorithm to subdivide at most
times to generate smooth contours.
You should realize that since it uses only a finite number of sample points, it is possible for
to miss features of your functions. To check your results, you should try increasing the settings for
The arguments supplied to functions in
are x, y, z, . Functions in
are by default supplied with scaled versions of these arguments.
returns [[data]].
Plot a 3D contour surface:
Plot several contour surfaces:
Use styling to emphasize features:
               
Introduced in 2007 (6.0) | Updated in 2014 (10.0)
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Enable JavaScript to interact with content and submit forms on Wolfram websites.flac3d 开采沉陷的 水平位移等值线求法flac3d 提供了 xyz轴分别的位移等值线图（contour）,例如 plot add contour xdisp（如下图）那有没有求出“”水平位移“”（综合xy轴方向的位移）的代码呢?求_作业帮
flac3d 开采沉陷的 水平位移等值线求法flac3d 提供了 xyz轴分别的位移等值线图（contour）,例如 plot add contour xdisp（如下图）那有没有求出“”水平位移“”（综合xy轴方向的位移）的代码呢?求
flac3d 开采沉陷的 水平位移等值线求法flac3d 提供了 xyz轴分别的位移等值线图（contour）,例如 plot add contour xdisp（如下图）那有没有求出“”水平位移“”（综合xy轴方向的位移）的代码呢?求大神相助!
只有综合xyz的disp.或者print disp,xdisp和ydisp手动运算.或者在flac 2d 里面直接dispSILVACO China - .::产品信息 > TCAD::. - Your DFM Partner from TCAD to CAD
VICTORY Process is a general purpose 3D process simulator. VICTORY Process includes a complete process flow core simulator and three advanced simulation modules: Monte Carlo Implant, Advanced Diffusion and Oxidation, and Physical Etch and Deposit.
VICTORY Cell is a fast, layout-driven 3D process simulator specifically designed for large structures.
ATHENA framework integrates several process simulation modules within a user-friendly environment provided by Silvaco TCAD interactive tools.
SSuprem4 is a 2D process simulator that is widely used in the semiconductor industry for design, analysis and optimization of various fabrication technologies.
MCImplant is a generic ion implantation simulator, which models ion stopping, defect generation, and ion implantation distributions in amorphous and crystalline materials.
Elite is an advanced 2D topography simulator for modeling physical etching, deposition, reflow and CMP planarization processes for modern semiconductor technologies.
MC Deposit/Etch is an advanced topology simulation module seamlessly interfaced with Elite through the ATHENA framework. .
Optolith is a powerful non-planar 2D lithography simulator that models all aspects of modern deep sub-micron lithography: imaging, exposure, photoresist bake, development and reflow.
ATHENA1D is a 1D mode of operation of the industry standard ATHENA 2D Process Simulator.
VICTORY Device is a general purpose 3D device simulator. A tetrahedral meshing engine is used for fast and accurate simulation of complex 3D geometries.
Device3D is a physics based 3D device simulator for any device type and includes material properties for the commonly used semiconductor materials in use today.
Giga3D module extends Device3D by incorporating the effects of self-heating into a device simulation.
MixedMode3D is a circuit simulator that includes physically-based 3D devices in addition to compact analytical models.
Quantum3D provides a set of models for simulation of the various effects of quantum confinement and quantum transport of carriers in semiconductor devices.
Luminous3D is an advanced simulator used to model absorption and photogeneration in semiconductor devices with arbitrary topology in three dimensions.
TFT3D is an advanced device technology simulator equipped with the physical models and specialized numerical techniques required to simulate amorphous or polysilicon devices in 3D.
LED3D is a module used for simulation and analysis of light emitting diodes. LED3D is integrated in the ATLAS framework and allows simulation of electrical, optical and thermal behavior of light emitting diodes in 3D.
Magnetic3D module enables the ATLAS device simulator to incorporate the effects of an externally applied magnetic field on the device behaviour.
Thermal3D is a general heatflow simulation module that predicts heatflow from any power generating devices (not limited to semiconductor devices), typically through a substrate and into the package and/or heatsink via the bonding medium.
ATLAS enables device technology engineers to simulate the electrical, optical, and thermal behavior of semiconductor devices.
S-Pisces is an advanced 2D device simulator for silicon based technologies that incorporates both drift-diffusion and energy balance transport equations.
Blaze simulates devices fabricated using advanced materials. It includes a library of binary, ternary and quaternary semiconductors. .
Giga combined with S-Pisces and Blaze device simulators allows simulation of self heating effects.
MixedMode is a circuit simulator that includes physically-based devices in addition to compact analytical models.
Quantum provides a set of models for simulation of various effects of quantum confinement and quantum transport of carriers in semiconductor devices.
Luminous is an advanced device simulator specially designed to model light absorption and photogeneration in non-planar semiconductor devices.
TFT is an advanced device technology simulator equipped with the physical models and specialized numerical techniques required to simulate amorphous or polysilicon devices including thin film transistors.
LED is a module used for simulation and analysis of light emitting diodes.
Organic Display module enables ATLAS to simulate the electrical and optical properties of organic display devices such as OTFTs and OLEDs.
Organic Solar module enables ATLAS to simulate the electrical and optical properties of organic solar cell devices, photodetectors and image sensors.
Laser is the world&s
first commercially available simulator for semiconductor laser diodes.
VCSEL is used in conjunction with the ATLAS framework to produce physically based simulations of vertical cavity surface emitting lasers (VCSELs).
Noise combined with S-Pisces or Blaze allows analysis of the small-signal noise generated within semiconductor devices.
Ferro has been developed to combine the charge-sheet model of FET with Maxwell&s first equation which describes the properties of the ferroelectric film.
Magnetic module enables the ATLAS device simulator to incorporate the effects of an externally applied magnetic field on the device behavior.
Mercury is an ATLAS module optimized for the fast simulation of FETs. Mercury is physics-based and so can be used for the predictive simulation of devices.
MC Device simulates the behavior of relaxed and strained silicon devices including non-equilibrium and ballistic effects in 2D.
VICTORY Stress is a generic 3D stress simulator designed to calculate stresses and mobility enhancement factors for any 3D structure using comprehensive material stress models, including the dependence of elasticity coefficients on crystal orientation.
DeckBuild is an interactive runtime and input file development environment within which all Silvaco&s TCAD and several other EDA products can run.
MaskViews is a simple to use, yet powerful layout editor that can read, write, create and edit layout files in either GDS2 or Silvaco&s layout format.
DevEdit can be used to either create a device from scratch or to remesh or edit an existing device.
Tonypolot is a powerful tool designed to visualize TCAD 1D and 2D structures produced by Silvaco TCAD simulators. TonyPlot provides visualization and graphic features such as pan, zoom, views, labels and multiple plot support.
TonyPlot3D is a powerful graphics tool, capable of displaying 3D TCAD data generated by Silvaco TCAD process or device simulators and Silvaco's 3D parasitic products.
VWF is software used for performing Design of Experiments (DOE) and Optimization Experiments. Split-lots can be used in various pre-defined analysis methods.
Gateway supports flat or hierarchical designs of any technology. Gateway readily accepts legacy designs from other schematic editors (PSPICE, OrCAD, Composer, etc) through EDIF 200 standard.
SmartSpice delivers the highest performance and accuracy required to design complex high precision analog circuits, analog mixed-signal circuits, analyze critical nets, characterize cell libraries, etc.. SmartSpice is compatible with popular analog design flows and foundry-supplied device models.
Verilog-A Language Compiled Verilog-A language combined with SmartSpice provides circuit designers and model developers with an easy-to-use, comprehensive environment for the design and verification of complex analog and mixed-signal circuits and models.
SmartSpice RF employs a combination of Time-Domain Shooting and Frequency-Domain Harmonic Balance methods to provide accurate simulation of GHz range RF ICs.
Harmony is a single-kernel analog/mixed-signal circuit simulator that dynamically links in the capabilities of the SmartSpice Circuit Simulator and the SILOS Verilog Simulator at run time.
Utmost III generates accurate, high quality SPICE models for analog, mixed-signal and RF applications.
Utmost IV represents the next generation in SPICE model optimization software. Building on many years experience, UTMOST IV provides powerful tool for developing SPICE models.
Spayn is a statistical modeling tool for analyzing variances from model parameter extraction sequences, electrical test routines, and circuit test measurements.
EXPERT is a high performance hierarchical IC layout editor with full editing features, large capacity and fast layout viewing.
Guardian provides interactive and batch mode verification of analog, mixed signal and RF IC designs.
HIPEX is an accurate and fast full-chip hierarchical extraction software that performs extraction of parasitic capacitances and resistances from hierarchical layouts.
Clarity RLC is an efficient and accurate tool that performs reduction of linear parasitic RLC elements in extracted netlists. Tool is based on Scattering-Parameter-Based Macromodeling and Time Domain methods.
Exact delivers the most accurate interconnect models for nanometer semiconductor processes and generates full chip layout parameter extraction (LPE) rule files.
Quest calculates 3D frequency dependent inductance, resistance, capacitance and capacitive loss for any multi-port network for RF SPICE analysis.
CLEVER is a physics-based RC extractor that uses GDSII mask data and process information to create a realistic 3D structure for MEMS, advanced CMOS, TFT, Memory cells, etc., using its built-in etch/deposit processor and optolithographical simulator.
STELLAR fills the size gap between typical small cell field solvers and full chip extractors.
SILOS is an easy-to-use IEEE- compliant Verilog simulator used by leading IC designers. An industry standard since 1986, its powerful interactive debugging features provide today&s most productive design environment for FPGA, PLD, ASIC and custom digital designs.
HyperFault is a Verilog IEEE- compliant fault simulator that analyzes test vectors& ability to detect faults. Supports mixed levels of gate, behavioral, and switch with SDF timing.
AccuCell is an accurate, automated, fast and flexible software tool for characterizing and validating standard cell, I/O and custom cell libraries.
AccuCore performs timing characterization of multi-million device circuits with SmartSpice accuracy and performs block and full-chip Static Timing Analysis (STA) on multi-million gate designs.
CatalystAd is the premier tool for converting transistor-level designs into verilog gate-level representations with applications in microprocessor, DSP, graphics and high-speed communication markets.
CatalystDA is a software program that translates a structural Verilog netlist into equivalent SPICE format netlist to be used for layout verification or SPICE simulation.
Spider is a netlist-to-GDSII place and route design flow for mainstream physical design and implementation.
Power - EM/IR - Thermal
Silvaco&s realibity analysis methodology answers design challenges and more accurately models IR-Drop, EM and thermal effects across all process nodes.
TonyPlot3D
TonyPlot3D是一个强大的图形工具，能够显示SILVACO 的TCAD工艺或器件仿真器以及SILVACO的三维寄生提取工具所生成的三维 TCAD 结构。它提供可视性和图形特征， 例如缩放、平移、查看和不同的绘图模式。TonyPlot3D 提供友好的界面环境，以多种TCAD类别的显示方式查看三维结构，例如区域、轮廓、射线、等表面和矢量等等。
可为ATLAS3D、VICTORY PROCESS和Simucad 的三维寄生产品生成逼真的三维视图
支持绕任意轴（x、y、z）的图形旋转、换位，或随鼠标直观移动的缩放
可绘制任何仿真变量的表面等高线图，如净掺杂、电势、电场和载流子浓度等
可绘制三维结构中的等值面图并探测任意点
可用鼠标设置材料不透明性及绘图模式
可轻松获取三维结构中的数量信息
材料或区域可被隐藏或移动，从而使分析清晰明了
全定制选项包括：材料颜色、工具栏和快捷键等
剖面（Cut-plane） 功能可定义 在结构中绕任意轴或在任意三个非共线指定点所构成的平面上的二维切割，并可将此二维剖面图导出至文件或TonyPlot
& & 1984 -
SILVACO Inc.Plot[f,{x,xmin,xmax}]
f，xmin到xmax
Plot[{f1,f2,f3...},{x,xmin,xmax}]
Plot[Evaluate[f],{x,xmin,xmax}]
先f算值再D
Plot[Evaluate[Table[f,..]],{x,xmin,xmax}]
a生出一系列函翟佼D
Plot[Evaluate[y[x]/.solution],{x,xmin,xmax}]
微分方程式解的D
不包含此目
不绦写隧目
AspectRatio
L比例，AOs０．６１８
1/GoldenRatio
是否含座溯SAxes-&{False,True}，只y的坐溯S
座溯S是否含擞。若要含擞，AxesLabel-&{&xlabel&,&ylabel&}，只有一的就是yS
AxesOrigin
AxesOrigin-&{x,y}
所使用的字型
$TextStyle
FormatType
StandardForm
DisplayFunction
如何展示D形，OIdentity⒉伙@示任何D形
$DisplayFunction
是否加外框
FrameLabel
是否XS下方以r的序砑釉]解
FrameLabel-&None
FrameLabel-&{x,y}O定下方左方的擞
FrameLabel-&{x1,y1,x2,y2}XS下方r方向O定四的擞
FrameTicks
橥饪蚣涌潭龋None不加，{xticks,yticks,..}O每一的刻度
PlotLabel-&labelO定整DD名
PlotRange-&AllL出所有D形
PlotRange-&{min,max}指定y方向的
PlotRange-&{{xmin,xmax},{ymin,ymax}}分e指定xy方向的
Ticks-&None ]有刻度
Ticks-&{xticks,yticks} O定xy方向刻度的位置
Ticks-&{{x1,label1,len1},{x2,label2,len2},....} 在xn位置填上labelnK指定nL度
TextStyle指令的下法：
ex:TextStyle-&{FontSize-&n, FontWeight-&&Bold&, FontFamily-&&Name& }
FontWeight
&Plain& or &Bold&
是否榇煮w字
&Plain& or &Italic&
是否樾斌w字
FontFamily
&Courier& ,&Times& ,&Helvetica&
GrayLevel[0]
Background
GrayLevel[1]
ListPlot[{y1 , y2, …}]
⒁的x散Y料出
ListPlot[{{x1,y1},{x2,y2},...}]
出{x1,y1},{x2,y2},..的c
ListPlot[list,PlotJoined －& True]
把c用段B起
ListPlot3D[{z11,z12,...},{z21,z22,...}]
3Dx散Y料LD
ListContourPlot[array]
ListDensityPlot[array]
指定色和l粗
Plot[{f1,f2,...},{x,xmin,xmax},PlotStyle-&{RGBColor[r1,g1,b1],RGBColor[r2,g2,b2],...}]
分e以RGB1，RGB2..分ef1,f2上色
Plot[{f1,f2,...},{x,xmin,xmax},PlotStyle-&{GrayLevel[i],GrayLevel[j],..}]
分e以GrayLeveli,j分ef1,f2上色
Plot[{f1,f2,...},{x,xmin,xmax},PlotStyle-&{Thickness[r1],Thickness[r2],...}]
指定r1,r2榫l的度
Show[plot]
重新@示一D
Show[plot1,plot2,...]
合plot1,plot2
Show[plot,option-&options]
Show[GraphicsArray[{{g1}, {g2}}]]
D形垂直K排
Show[GraphicsArray[{g1, g2}]]
D形水平K排
Show[GraphicsArray[{{g1, g2}, {g3, g4}}]]
D形排成矩形式
ParametricPlot[{x[t], y[t]}, {t, tmin, tmax}]
ParametricPlot[[{x1[t], y1[t]}, {x2[t], y2[t]},...],{t, tmin, tmax}]
ParametricPlot[{x[t], y[t]}, {t, tmin, tmax},AspectRatio -& Automatic]
保持x:y的比例1:1
ContourPlot[f, {x,xmin,xmax}, {y,ymin,ymax}]
ColorFunction
高度z的{zmin, zmax} , All or Automatic
ContourShading
Contours的上色 False不上色
PlotPoints
函翟诟鞣较虻淖钌冱c
ContourLines
是否要等高
是否要g欲L出的函党C器a
DensityPlot[f, {x,xmin,xmax}, {y,ymin,ymax}]
是否加上W格
PlotPoints
各方向取狱c的最少的
ColorFunction
x色，Hue樯剩AO榛译A
是否要g欲L出的函党C器a
Plot3D[f,{x,xmin,xmax},{y,ymin,ymax}]
指定xy的出f的3dD
Plot3D[f,GrayLevel[g],{x,xmin,xmax},{y,ymin,ymax}]
三SD依g砩匣译A
Plot3D[f,Hue[g],{x,xmin,xmax},{y,ymin,ymax}]
三SD依g砩先
是否要座溯S
每一S的耸{xlabel, ylabel, zlabel}
是否在外面加一3d的盒子
ColorFunction
上色的方式。Hue是表示一系列色彩
$TextStyle
FormatType
StandardForm
DisplayFunction
@示D形的模式。IdentityoD形@示
$DisplayFunction
是否加上表面W格。All表示每一面都加上W格
HiddenSurface
是否除去[藏
是否用光源砩仙
是否加上W格
Z方向上LD的
表面是否上色和留白
{1.3,-2.4,2}
PlotPoints
不同方向取狱c的的
是否要g欲L出的函党C器a
其中ViewPoint的
{1.3,-2.4,2}
前方上面往下面看
前方下面往上面看
ParametricPlot3D[{f1,f2,f3},{t,tmin,tmax}]
以t诞出三S的cf1,f2,f3
ParametricPlot3D[{f1,f2,f3},{t,tmin,tmax},{u,umin,umax}]
以t,u诞出三S的cf1,f2,f3
ParametricPlot3D[{{f1,f2,f3},{g1,g2,g3}},..]
ParametricPlot3D[{f1,f2,f3,h},....]
Show[ContourGraphics[h]]
D形D成等高D
Show[DensityGraphics[h]]
D形D成密度D
Show[SurfaceGraphics[h]]
D形D成三S立wD
Show[Graphics[h]]
⑷SD成二S影像
D元和段控制指令
GrayLevel[i]
RGBColor[r,g,b]
t{G，rgb都是0到1的底
0到1的色彩
Hue[h,s,b]
指定色彩h、和度s、亮度b
Thickness[r]
AbsoluteThickness[s]
Dashing[{r1,r2,..}]
AbsoluteDashing[{s1,s2,..}]
以^挝碜樘段的L度
三S基本D元
Point[{x,y,z}]
{x,y,z}的c
Line[{x1,y1,z1},{x2,y2,z2},...]
B接不同c的段
Polygon[{x1,y1,z1},{x2,y2,z2},...]
Cuboid[{x1,y1,z1},{x2,y2,z2}]
Text[expr,{x,y,z}]
以c橹行牡奈淖expr
&& Graphics`Graphics`
LogPlot[f,{x,x1,x2}]
LogLinearPlot[f,{x,x1,x2}]
LogLogPlot[f,{x,x1,x2}]
LogListPlot[{x1,y1},{x2,y2},...]
串列LD，yS
LogLinearListPlot[{x1,y1},{x2,y2},...]
串列LD，xS
LogLogListPlot[{x1,y1},{x2,y2},...]
串列LD，x,yS
&& Graphics`Graphics`
PolarPlot[f,{t,t1,t2}]
O坐死LD，角度t1到t2
PolarPlot[{f1,f2,f3},{t,t1,t2}]
PolarListPlot[{r1,r2,...}]
以相等角度L出距原cr1,r2的等
&& Graphics`ImplicitPlot`
ImplicitPlot[eqn,{x,x1,x2}]
於指定茸鲭[函道LD
ImplicitPlot[{eqn1,eqn2,...},ranges,options]
&& Graphics`PlotField`
PlotVectorField[{fx,fy},{x,xmin,xmax},{y,ymin,ymax}]
PlotGradientField
函f的梯度向量
ScaleFactor
依比例出箭^的大小
ScaleFunction
用碇付^大小的函
ColorFunction
HeadLength
O定箭^的大小
三S等值曲的指令
&& Graphics`ContourPlot3D`
ContourPlot3D[[f,{x,xmin,xmax},{y,ymin,ymax},{z,zmin,zmax}]]
f=constant的三S等值曲面D
x散Y料的LD
&& Graphics`Graphics3D`
ScatterPlot3D[{x1,y1,z1},{x2,y2,z2},..]
Y料c的3度空gLD
ScatterPlot3D[{{x1,y1,z1},{x2,y2,z2},..},PlotJoined -& True]
h投影到三平面上
ShadowPlot3D[f,{x,xmin,xmax},{y,ymin,ymax}]
投影到xy平面上
StackGraphics[{h1,h2,..}]
h1,h2,..B起沓槿S的物件
三S向量龊吞荻鹊睦LD
&& Graphics`PlotField3D`
PlotVectorField3D[{f1,f2,f3},{x,xmin,xmax},{y,ymin,ymax},{z,zmin,zmax}]
三S向量隼LD
PlotGradientField3D[f,{x,xmin,xmax},{y,ymin,ymax},{z,zmin,zmax}]
三S梯度向量隼LD
SphericalPlot3D[r,{theta,min,max},{phi,min,max}]
TextListPlot[{x1,y1,&s1&},....]
用Sn的字串砻枥L出xn,yn
ListPlotVectorField[list]
用listY的二S列懋出向量
&&Graphics`Animation`
Animate[plot,{t,tmin,tmax}]
以不同的t绦plot
ShowAnimation[{g1,g2,...}]
依序绦g碚故赢
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